Semiconductor Advanced FEOL Surface Preparation
From wafer start to contact module, improve the yield, flexibility and productivity of FEOL (front-end-of-line) silicon wafer cleaning and surface preparation processes with advanced J.T.BakerĀ® performance chemistries.
Our expanding J.T.BakerĀ® portfolio of FEOL surface preparation products utilize advanced combinations of organic and semi-aqueous formulations fine-tuned to interact with, selectively etch and efficiently clean the most advanced integration schemes.
Products Available
Aluminum/Silicon Oxide Compatible Residue Remover
Copper Compatible Residue Remover
Low-k Dielectric Compatible Residue Remover
Hard mask removal or modification
Photoresist Stripper
Bulk Photoresist Stripper