Semiconductor Advanced FEOL


Semiconductor Advanced FEOL Surface Preparation


From wafer start to contact module, improve the yield, flexibility and productivity of FEOL (front-end-of-line) silicon wafer cleaning and surface preparation processes with advanced J.T.BakerĀ® performance chemistries.

Our expanding J.T.BakerĀ® portfolio of FEOL surface preparation products utilize advanced combinations of organic and semi-aqueous formulations fine-tuned to interact with, selectively etch and efficiently clean the most advanced integration schemes.


Products Available


Aluminum/Silicon Oxide Compatible Residue Remover

Copper Compatible Residue Remover

Low-k Dielectric Compatible Residue Remover

Hard mask removal or modification

Photoresist Stripper

Bulk Photoresist Stripper